RESUMEN
Bioprocesses, such as biofiltration, are commonly used to treat industrial effluents containing volatile organic compounds (VOCs) at low concentrations. Nevertheless, the use of biofiltration for indoor air pollution (IAP) treatment requires adjustments depending on specific indoor environments. Therefore, this study focuses on the convenience of a hybrid biological process for IAP treatment. A biofiltration reactor using a green waste compost was combined with an adsorption column filled with activated carbon (AC). This system treated a toluene-micropolluted effluent (concentration between 17 and 52 µg/m3), exhibiting concentration peaks close to 733 µg/m3 for a few hours per day. High removal efficiency was obtained despite changes in toluene inlet load (from 4.2 x 10(-3) to 0.20 g/m3/hr), which proves the hybrid system's effectiveness. In fact, during unexpected concentration changes, the efficiency of the biofilter is greatly decreased, but the adsorption column maintains the high efficiency of the entire process (removal efficiency [RE] close to 100%). Moreover, the adsorption column after biofiltration is able to deal with the problem of the emission of particles and/or microorganisms from the biofilter. Implications: Indoor air pollution is nowadays recognized as major environmental and health issue. This original study investigates the performance of a hybrid biological process combining a biofilter and an adsorption column for removal of indoor VOCs, specifically toluene.
Asunto(s)
Contaminantes Atmosféricos/metabolismo , Contaminación del Aire Interior/prevención & control , Restauración y Remediación Ambiental/métodos , Tolueno/metabolismo , Adsorción , Biodegradación Ambiental , Reactores Biológicos , Carbón Orgánico/metabolismo , FiltraciónRESUMEN
We present a method allowing us to obtain localized heating that is compatible with high-temperature operation and real time scanning and transmission electron microscopy. Localized heating is induced by flowing current through tungsten nanowires deposited by focused ion-beam-induced deposition on a 50-nm-thick Si(3)N(4) membrane. Based on the heat transport between the nanowire and the substrate, we applied an analytical model to obtain the temperature profile as a function of electrical power. In this model, the key parameter is the thermal resistance between the nanowire and the substrate that we determined experimentally by measuring electrical power and local temperature. The local temperature is measured by observing the evaporation of gold nanoparticle by electron microscopy. These in situ heating and temperature-probing capabilities are used to study the crystallization of the Si(3)N(4) membrane and the growth of silicon nanowires.
RESUMEN
Surface treatment optimization requires the control of the ion dose and the workpiece temperature, two parameters that are not trivially measurable in plasma-based ion implantation. A temperature and ion fluence monitoring system has been developed and implemented in a plasma-based ion implanter. It is based on the measurement with a thermopile of the radiation emitted from the back face of a thin copper disk inserted in the stainless steel sample holder. Since the incident ions carry practically all the incident power, the measurement of the Cu disk temperature that increases during implantation can provide an evaluation of the ion fluence in real time. A model has been developed for the deconvolution of the temperature data and has been fitted to the temperature behavior during implantation. A good agreement between the total integrated doses, evaluated with Rutherford backscattering spectroscopy characterization, and the ion fluence calculated by means of this model has been obtained with a discrepancy less than 16%.