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1.
ACS Appl Mater Interfaces ; 7(3): 1833-40, 2015 Jan 28.
Artículo en Inglés | MEDLINE | ID: mdl-25545199

RESUMEN

The molecular order of organic semiconductors at the gate dielectric is the most critical factor determining carrier mobility in thin film transistors since the conducting channel forms at the dielectric interface. Despite its fundamental importance, this semiconductor-insulator interface is not well understood, primarily because it is buried within the device. We fabricated dinaphtho[2,3-b:2',3'-f]thieno[3,2-b]thiophene (DNTT) thin film transistors by thermal evaporation in vacuum onto substrates held at different temperatures and systematically correlated the extracted charge mobility to the crystal grain size and crystal orientation. As a result, we identify a molecular layer of flat-lying DNTT molecules at the semiconductor-insulator interface. It is likely that such a layer might form in other material systems as well, and could be one of the factors reducing charge transport. Controlling this interfacial flat-lying layer may raise the ultimate possible device performance for thin film devices.

2.
J Phys Chem Lett ; 5(8): 1374-9, 2014 Apr 17.
Artículo en Inglés | MEDLINE | ID: mdl-26269982

RESUMEN

Combined photoemission and charge-transport property studies of the organic hole transport material 2,2',7,7'-tetrakis(N,N-di-p-methoxyphenylamine)-9,9'-spirobifluorene (spiro-MeOTAD) under air exposure and controlled environments of O2, H2O + N2, and N2 (1 atm and under dark conditions) reveal the incorporation of gas molecules causing a decrease in charge mobility. Ultraviolet photoelectron spectroscopy shows the Fermi level shifts toward the highest occupied molecular orbital of spiro-MeOTAD when exposed to air, O2, and H2O resembling p-type doping. However, no traces of oxidized spiro-MeOTAD(+) are observed by X-ray photoelectron spectroscopy (XPS) and UV-visible spectroscopy. The charge-transport properties were investigated by fabricating organic field-effect transistors with the 10 nm active layer at the semiconductor-insulator interface exposed to different gases. The hole mobility decreases substantially upon exposure to air, O2, and H2O. In the case of N2, XPS reveals the incorporation of N2 molecules into the film, but the decrease in the hole mobility is much smaller.

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