RESUMEN
Resists that enable high-throughput and high-resolution patterning are essential in driving the semiconductor technology forward. The ultimate patterning performance of a resist in lithography is limited because of the trade-off between resolution, line-width roughness, and sensitivity; improving one or two of these parameters typically leads to a loss in the third. As the patterned feature sizes approach angstrom scale, the trade-off between these three metrics becomes increasingly hard to resolve and calls for a fundamental rethinking of the resist chemistry. Low-molecular-mass monodispersed metal-containing resists of high atom economy can provide not only very high resolution but also very low line-width roughness without sacrificing sensitivity. Here we describe a modular metal-containing resist platform (molecular mass <500 Da) where a molecular resist consists of just two components: a metal and a radical initiator bonded to it. This simple system not only is amenable to high-resolution electron beam lithography (EBL) and extreme ultraviolet lithography (EUVL) but also unites them mechanistically, giving a consolidated perspective of molecular and chemical processes happening during exposure. Irradiation of the resist leads to the production of secondary electrons that generate radicals in the initiator bonded to metal. This brings about an intramolecular rearrangement and causes solubility switch in the exposed resist. We demonstrate record 1.9-2.0 nm isolated patterns and 7 nm half-pitch dense line-space features over a large area using EBL. With EUVL, 12 nm half-pitch line-space features are shown at a dose of 68 mJ/cm2. In both of these patterning techniques, the line-width roughness was found to be ≤2 nm, a record low value for any resist platform, also leading to a low-performance trade-off metric, Z factor, of 0.6 × 10-8 mJ·nm3. With the ultimate resolution limited by instrumental factors, potential patterning at the level of a unit cell can be envisaged, making low-molecular-mass resists best poised for angstrom-scale lithography.
RESUMEN
It has been long known that low molecular weight resists can achieve a very high resolution, theoretically close to the probe diameter of the electron beam lithography (EBL) system. Despite technological improvements in EBL systems, the advances in resists have lagged behind. Here we demonstrate that a low-molecular-mass single-source precursor resist (based on cadmium(II) ethylxanthate complexed with pyridine) is capable of a achieving resolution (4 nm) that closely matches the measured probe diameter (â¼3.8 nm). Energetic electrons enable the top-down radiolysis of the resist, while they provide the energy to construct the functional material from the bottom-upâunit cell by unit cell. Since this occurs only within the volume of resist exposed to primary electrons, the minimum size of the patterned features is close to the beam diameter. We speculate that angstrom-scale patterning of functional materials is possible with single-source precursor resists using an aberration-corrected electron beam writer with a spot size of â¼1 Å.
RESUMEN
Bound-states-in-the-continuum (BIC) is an emerging concept in nanophotonics with potential impact in applications, such as hyperspectral imaging, mirror-less lasing, and nonlinear harmonic generation. As true BIC modes are non-radiative, they cannot be excited by using propagating light to investigate their optical characteristics. In this paper, for the 1st time, we map out the strong near-field localization of the true BIC resonance on arrays of silicon nanoantennas, via electron energy loss spectroscopy with a sub-1-nm electron beam. By systematically breaking the designed antenna symmetry, emissive quasi-BIC resonances become visible. This gives a unique experimental tool to determine the coherent interaction length, which we show to require at least six neighboring antenna elements. More importantly, we demonstrate that quasi-BIC resonances are able to enhance localized light emission via the Purcell effect by at least 60 times, as compared to unpatterned silicon. This work is expected to enable practical applications of designed, ultra-compact BIC antennas such as for the controlled, localized excitation of quantum emitters.
RESUMEN
The Particle-in-Cell (PIC) method for plasmons provides a mechanical, single-particle picture of plasmon resonances by tracking in time the movement of all the individual conduction electrons. By applying it to gold nanorods, we demonstrate the usefulness of PIC for extracting time-domain information of plasmons such as plasmon decay times, the relative contribution of each plasmon damping channel, detailed electron movement, as well as radiation and hot electron-emission during damping. An analysis of the time-resolved velocity distribution of the conduction electrons shows that only a small offset in this distribution in each cycle constitutes the plasmon oscillation. We show how PIC can be used to separately analyse Landau damping and Drude damping, and how their decay times can be calculated. Electron-electron scattering and surface scattering are both shown to gradually increase the overall kinetic energy of the electrons and decrease their coherence.
RESUMEN
This work presents a procedure for large-area patterning of designed plasmon resonators that are much smaller than possible with conventional lithography techniques. Fused Colloidal Nanopatterning combines directed self-assembly and controlled fusing of spherical colloidal nanoparticles. The two-step approach first patterns a surface covered with hydrogen silsesquioxane, an electron beam resist, forming traps into which the colloidal gold nanoparticles self-assemble. Second, the patterned nanoparticles are controllably fused to form plasmon resonators of any 2D designed shape. The heights and widths of the plasmon resonators are determined by the diameter of the nanoparticle building blocks, which can be well below 10 nm. By performing the fusing step with UV ozone and heat exposure, we demonstrate that the process is easily scalable to cover large areas on silicon wafers with designed gold nanostructures. The procedure neither requires adhesion layers nor a lift-off process, making it ideally suited for plasmonics, in comparison with regular electron beam lithography. We use monochromated electron energy loss spectroscopy (EELS) in scanning transmission electron microscopy and boundary element method simulations to demonstrate that the designed plasmon resonators are directly tunable via the pattern design. We foresee future expansion of this approach for applications such as plasmon-enhanced photocatalysis and for large-scale patterning where chemical, optical, or confinement properties require sub-10 nm metal lines.
RESUMEN
The structural details of nanoparticles at the sub-particle level are critical for our understanding of their functionalities and the basic mechanisms involved in their formation. In particular, the geometries of such features determine the particle's overall optical response. Hollow metallic nanoparticles (hollow-MNPs) that have cubic geometries, with varying morphologies on their walls and voids in their body, offer a platform to study the effects of such structural features on the properties of single nanoparticles and their ensemble. Here, we report the control over sub-particle pinholes and voids by modifying the dynamics of the galvanic reaction, and we connect these structures to the optical response of the hollow nanocubes. We observe that symmetry breakage in individual particles, caused by pinholes and voids, has a drastic effect on the plasmon-resonance peak positions in their UV-Vis-NIR spectra. Via electron microscopy imaging, statistical analyses, and electromagnetic simulations, we observe that enlargement in a pinhole's diameter and an increase in their number produce a redshift in the resonance absorption peak of the ensemble. Our results outline nanoparticle design avenues via sub-particle morphologies for several applications, including those operating in the biological window and those carrying chemical payloads in organisms.
RESUMEN
We report on the high resolution imaging of multipolar plasmonic resonances in aluminum nanoantennas using electron energy loss spectroscopy (EELS). Plasmonic resonances ranging from near-infrared to ultraviolet (UV) are measured. The spatial distributions of the multipolar resonant modes are mapped and their energy dispersion is retrieved. The losses in the aluminum antennas are studied through the full width at half-maximum of the resonances, unveiling the weight of both interband and radiative damping mechanisms of the different multipolar resonances. In the blue-UV spectral range, high order resonant modes present a quality factor up to 8, two times higher than low order resonant modes at the same energy. This study demonstrates that near-infrared to ultraviolet tunable multipolar plasmonic resonances in aluminum nanoantennas with relatively high quality factors can be engineered. Aluminum nanoantennas are thus an appealing alternative to gold or silver ones in the visible and can be efficiently used for UV plasmonics.