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1.
J Synchrotron Radiat ; 25(Pt 5): 1417-1424, 2018 Sep 01.
Artículo en Inglés | MEDLINE | ID: mdl-30179181

RESUMEN

Pd/Y multilayers are high-reflectance mirrors designed to work in the 7.5-11 nm wavelength range. Samples, prepared by magnetron sputtering, are deposited with or without B4C barrier layers located at the interfaces of the Pd and Y layers to reduce interdiffusion, which is expected from calculating the mixing enthalpy of Pd and Y. Grazing-incident X-ray reflectometry is used to characterize these multilayers. B4C barrier layers are found to be effective in reducing Pd-Y interdiffusion. Details of the composition of the multilayers are revealed by hard X-ray photoemission spectroscopy with X-ray standing wave effects. This consists of measuring the photoemission intensity from the samples by performing an angular scan in the region corresponding to the multilayer period and an incident photon energy according to Bragg's law. The experimental results indicate that Pd does not chemically react with B nor C at the Pd-B4C interface while Y does react at the Y-B4C interface. The formation of Y-B or Y-C chemical compounds could be the reason why the interfaces are stabilized. By comparing the experimentally obtained angular variation of the characteristic photoemission with theoretical calculations, the depth distribution of each component element can be interpreted.

2.
Phys Rev E ; 96(4-1): 043205, 2017 Oct.
Artículo en Inglés | MEDLINE | ID: mdl-29347625

RESUMEN

We describe a model for the study of the interaction of short x-ray free-electron laser (XFEL) pulses with large finite samples. Hydrodynamics is solved in one-dimensional planar geometry with consideration of the electron-ion energy exchange and of the possible elastoplastic behavior. From a time-dependent calculation of the complex refractive index and of the underlying atomic physics, XFEL energy deposition is modeled through a calculation of the radiation field in the material. In the case of hard x-ray irradiation, energetic electrons induced by the XFEL absorption can propagate and deposit their energy outside the interaction region. Simulations of the interaction of hard x-ray ultrashort pulses with solid materials Ru and Si at different grazing incidence angles are presented and discussed. The results obtained demonstrate the potential of this approach to predict damage dynamics for materials of interest for x-ray optics.

3.
J Phys Condens Matter ; 23(24): 246004, 2011 Jun 22.
Artículo en Inglés | MEDLINE | ID: mdl-21613723

RESUMEN

A systematic investigation of the structure, nature of the interface and their possible connections with magnetic properties for the as-deposited Co/Si/Co trilayer system has been carried out. X-ray reflectivity, cross-sectional transmission electron microscopy and x-ray emission measurements performed on the Co/Si/Co trilayer system show that when the Si layer thickness is less than ∼ 20 Å, the full Si layer is converted into a cobalt silicide layer whereas when the Si layer thickness > 20 Å along with the silicide layer. the pure Si layer also remains. A comparison of magneto-optical Kerr effect and magnetoresistance measurements reveals the absence of antiferromagnetic coupling in these samples. Double-step-like magnetization, in the case of Si layer thickness > 20 Å between two Co layers, is explained by magnetization reversal of two ferromagnetic layers having different coercivities, independent of each other.


Asunto(s)
Cobalto/química , Magnetismo , Modelos Químicos , Silicio/química , Simulación por Computador , Ensayo de Materiales
4.
J Phys Condens Matter ; 22(34): 345003, 2010 Sep 01.
Artículo en Inglés | MEDLINE | ID: mdl-21403247

RESUMEN

We present an experimental study of the evolution of the surface of a growing film as a function of the statistical parameters of the virgin substrate roughness. The growth of sputter-deposited Al(2)O(3) films onto Si substrates was followed in situ using an x-ray scattering technique. Despite the use of substrates presenting different roughness correlation length and crystallographic orientation, the evolution of the film roughness is demonstrated to obey the same scaling law, i.e., with the same static and dynamic exponents. Approaches to accurately determine the scaling exponents from x-ray scattering data are discussed.

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