RESUMEN
Optical monitoring of thin film interference filters is of primary importance for two main reasons: possible error compensation and greater thickness accuracy of the deposited layers compared to non-optical methods. For many designs, the latter reason is the most crucial, because for complex designs with a large number of layers, several witness glasses are used for monitoring and error compensation with a classical monitoring approach is no longer possible for the whole filter. One optical monitoring technique that seems to maintain some form of error compensation, even when changing witness glass, is broadband optical monitoring, as it is possible to record the determined thicknesses as the layers are deposited and re-refine the target curves for remaining layers or recalculate the thicknesses of remaining layers. In addition, this method, if used properly, can, in some cases, provide greater accuracy for the thickness of deposited layers than monochromatic monitoring. In this paper, we discuss the process of determining a strategy for broadband monitoring with the goal of minimizing thickness errors for each layer of a given thin film design.
RESUMEN
In this paper we study the wavelength selection process for optical monitoring of thin film filters. We first discuss the technical limitations of monitoring systems as well as the criteria defining the sensitivity of different wavelengths to thickness errors. We then present an approach that considers the best monitoring wavelength for each individual layer with a monitoring strategy selection process that can be fully automated. We finally validate experimentally the proposed approach on several optical filters of increasing complexity. Optical interference filters with close to theoretical performances are demonstrated.
RESUMEN
We present a thorough study of a bandpass filter for the near-infrared (IR) region, with bandwidth below 20 nm, high transmission, and a broad rejection band [350-1100] nm. This filter is angularly tunable between 0 and 50° and shows a shift of the central wavelength from 970 nm down to 880 nm, without major changes in its bandwidth and spectral shape for unpolarized light. We first provide a description of the design procedure and then carry out an experimental demonstration by using plasma-enhanced reactive magnetron sputtering. We finally present an accurate characterization of this class of filter by using a custom optical system.