RESUMEN

A measurement technique, pulsed thermoluminescence, is described which uses short thermal pulses to excite trapped carriers leading to radiative recombination. The pulses are obtained using microstructures with approximately 500 micros thermal time constants. The technique has many of the advantages of pulsed optically stimulated luminescence without the need for optical sources and filters to isolate the luminescent signal. Charge carrier traps in alpha-Al(2)O(3):C particles on microheaters were filled using 205 nm light. Temperature pulses of 10 and 50 ms were applied to the heaters and compared with a standard thermoluminescence curve taken at a ramp rate of 5 K s(-1). This produced curves of intensity verses temperature similar to standard thermoluminescence except shifted to higher temperatures. The luminescence of single particles was read multiple times with negligible loss of population. The lower limit of the duration of useful pulses appears to be limited by particle size and thermal contact between the particle and heater.

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RESUMEN

High-aspect-ratio channels may be coated using atomic layer deposition (ALD) due to the unique self-limiting nature of the process, and this has been often demonstrated using deep reactive-ion etched trenches in silicon. However, for optical and microfluidic applications, many channels are centimeters deep with diameters of tens to hundreds of micrometers, and the relatively large area exposes more difficult problems of temperature and gas flow uniformity. To quantify the uniformity of optical coatings deposited by ALD under those conditions, an air wedge has been created between two square wafers of silicon approximately 7 cm on a side, with the air gap varying linearly from 0-1560 microm. ALD aluminum oxide uniformity is astounding, while hafnium oxide shows a need for process optimization, but still exceeds the capability observed in other deposition techniques. A six-layer Fabry-Perot optical cavity with fixed 500 nm resonance was deposited inside a wedge, and the measured resonant wavelength closely matched predictions, except at the deepest regions of the wedge.

RESUMEN

Optical coating degradation under laser irradiation can take several forms. Perhaps the most common that is not due to particulates is thermal breakdown, caused by heating of the coating to a catastrophic failure induced by local melting, delamination, evaporation, or some other change. We demonstrate that micromachined dielectric membranes show strong differences in their hydroxyl signatures as measured by Fourier-transform IR spectroscopy. The changes correspond to regions of high fluence (3200 J/cm2) from a Nd:YAG laser. It is found that the absorption peaks associated with OH decrease after laser treatment, indicating a reduction in the number of film hydroxyl groups.

RESUMEN

A mechanical design technique for optical coatings that simultaneously controls thermal deformation and optical reflectivity is reported. The method requires measurement of the refractive index and thermal stress of single films prior to the design. Atomic layer deposition was used for deposition because of the high repeatability of the film constants. An Al2O3/HfO2 distributed Bragg reflector was deposited with a predicted peak reflectivity of 87.9% at 542.4 nm and predicted edge deformation of -360 nm/K on a 10 cm silicon substrate. The measured peak reflectivity was 85.7% at 541.7 nm with an edge deformation of -346 nm/K.

RESUMEN

Thin films composed of SiO(2) nanorods or nanoporous SiO(2) (np- SiO(2)) are attractive for use as a low refractive index material in various types of optical coatings. However, the material properties of these films are unstable because of the high porosity of the films. This is particularly apparent in dry versus humid atmospheres where both the refractive index and coefficient of thermal expansion (CTE) vary dramatically. In this article, we demonstrate that np-SiO(2) can be encapsulated by depositing Al(2)O(3) with Atomic Layer Deposition (ALD), stabilizing these properties. In addition, this encapsulation ability is demonstrated successfully in a 4-pair distributed Bragg reflector (DBR) design. It is hoped that this technique will be useful in patterning specific regions of a film for optical and mechanical stability while other portions are ambient-interactive for sensing.