RESUMEN
Worldwide, an estimated 6 million patients seek medical attention for burns annually. Various treatment methods and materials have been investigated and developed to enhance burn wound healing. Recently, a new technology, plasma medicine, has emerged to offer new solutions in wound care. As the development of plasma medicine has shown benefit in wound healing, we aimed to assess the effects of plasma medicine on burn wounds. To investigate the effectiveness of a nonthermal atmospheric pressure plasma jet (NAPPJ) for burn wound treatment on a brass comb burn wound rat model. Burn wounds were made by applying a preheated brass comb (100°C) for 2 minutes, which resulted in four full-thickness burn wounds separated by three interspaces. Interspaces were exposed to NAPPJ treatment for 2 minutes and morphological changes and neutrophil infiltration were monitored at 0, 4, and 7 days post-wounding. The percentage of necrotic interspace was higher in the control group than in the plasma-treated group (51.8 ± 20.5% vs 31.5 ± 19.0%, P < .001). Moreover, the exposure of interspace to NAPPJ greatly reduced the number of infiltrating neutrophils. In addition, the percentage of interspace that underwent full-thickness necrosis in the plasma-treated group was smaller than that in the control group (28% vs 67%). NAPPJ exposure on interspaces has a positive effect on burn wounds leading to wound healing by reducing burn injury progression.
Asunto(s)
Quemaduras/terapia , Gases em Plasma , Cicatrización de Heridas , Animales , Quemaduras/patología , Modelos Animales , Necrosis , Infiltración Neutrófila , Estudios Prospectivos , Distribución Aleatoria , Ratas Sprague-DawleyRESUMEN
Carborane powders (C2B10H12) were deposited on silicon substrates and the physical properties of the films were investigated as functions of the distance of the sample from the electrode, the carborane mass, and the plasma-pulse. To obtain the optimum thickness of the films, three silicon substrates were positioned at 6.5, 16.5, and 36.5 cm from the electrode, and the thickness of the samples was analyzed by using XRD, TEM, and SEM. For the deposition, the carborane powder was warmed to 80 degrees C in 10 minutes and was applied a DC-power pulse of 900 W (150 volts, 6 amps) for 2 hours. The mass of carborane and the on-time sequence were varied during the deposition. The combined results of XRD and TEM studies revealed that the structure of the deposited film is an amorphous phase. A careful analysis of the SEM images show that the thickness of the carborane films increased as increasing the mass of the flown carborane while it remained constant when a plasma-pulse time was varied. The thickest film of 353 A was achieved from the samples placed closest to the carborane inlet and the thickness became thinner as farther from the source suggesting that the density of the evaporated carborane powder in a chamber decreased as increasing the distance of the sample from the carborane inlet.
Asunto(s)
Boranos/química , Carbono/química , Deuterio/química , Membranas Artificiales , Nanoestructuras/química , Nanoestructuras/ultraestructura , Gases em Plasma/química , Cristalización/métodos , Galvanoplastia/métodos , Sustancias Macromoleculares/química , Ensayo de Materiales , Conformación Molecular , Tamaño de la Partícula , Propiedades de SuperficieRESUMEN
A wave equation is kinetically derived for an electron beam to describe the linear electrostatic perturbations propagating in the perpendicular direction with respect to the applied magnetic field in a planar E x B amplifier in which the operating electric field is inhomogeneous. For omega(c)>omega(p), the massless guiding center limit is taken to obtain the wave equation for the analysis of the electrostatic instability encountered in the planar E x B amplifier. In this work the plasma density profile is assumed to be a step function with vacuum boundaries between the cathode and the anode. The growth rates of the perpendicular electrostatic wave are obtained for the parameters such as the location and the thickness of the electron beam as well as the wave number.
Asunto(s)
Amplificadores Electrónicos , Diseño Asistido por Computadora , Ciclotrones/instrumentación , Fenómenos Electromagnéticos/instrumentación , Electrones , Diseño de Equipo , Análisis de Falla de Equipo , Electricidad EstáticaRESUMEN
A Multi-Purpose Plasma (MP(2)) facility has been renovated from Hanbit mirror device [Kwon et al., Nucl. Fusion 43, 686 (2003)] by adopting the same philosophy of diversified plasma simulator (DiPS) [Chung et al., Contrib. Plasma Phys. 46, 354 (2006)] by installing two plasma sources: LaB(6) (dc) and helicon (rf) plasma sources; and making three distinct simulators: divertor plasma simulator, space propulsion simulator, and astrophysics simulator. During the first renovation stage, a honeycomblike large area LaB(6) (HLA-LaB(6)) cathode was developed for the divertor plasma simulator to improve the resistance against the thermal shock fragility for large and high density plasma generation. A HLA-LaB(6) cathode is composed of the one inner cathode with 4 in. diameter and the six outer cathodes with 2 in. diameter along with separate graphite heaters. The first plasma is generated with Ar gas and its properties are measured by the electric probes with various discharge currents and magnetic field configurations. Plasma density at the middle of central cell reaches up to 2.6 x 10(12) cm(-3), while the electron temperature remains around 3-3.5 eV at the low discharge current of less than 45 A, and the magnetic field intensity of 870 G. Unique features of electric property of heaters, plasma density profiles, is explained comparing with those of single LaB(6) cathode with 4 in. diameter in DiPS.