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Bessel beam arrays are highly attractive due to non-diffraction properties, parallel processing, and large capacity capabilities. However, conventional approaches of generating Bessel beams, such as spatial light modulators, axicons, and diffraction optical elements, suffer from various limitations of system complexity and bulkiness, low uniformity, and limited numerical aperture (NA). The limited NA imposes constraints on achieving minimal full width at half maximum (FWHM) of the Bessel beam, ultimately compromising the resolution of the beam. In this study, we demonstrate a method for generating Bessel beam arrays with regular and random patterns via an ultra-compact metasurface. This approach integrates the phase profile of an optimized beam splitter with a meta-axicon. The Bessel beam arrays exhibit subwavelength dimensions of FWHM (590 nm, ∼0.9λ) and relatively high uniformity of 90% for N A=0.2 and 69% for N A=0.4. Furthermore, the method achieves effective suppression of background noise and zeroth-order intensity compared to methods based on Dammann grating (DG) based metasurfaces. The proposed method highlights potential applications of Bessel beam arrays in various fields, such as laser machining, optical communication, and biomedical imaging.

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Highly reflective surfaces are notorious in the field of depth sensing and three-dimensional (3D) imaging because they can cause severe errors in perception of the depth. Despite recent progress in addressing this challenge, there are still no robust and error-free solutions. Here, we devise a polarization structured light 3D sensor for solving these problems, in which high-contrast-grating (HCG) vertical-cavity surface-emitting lasers (VCSELs) are used to exploit the polarization property. We demonstrate accurate depth measurements of the reflective surfaces and objects behind them in various imaging situations. In addition, the absolute error and effective measurement range are measured to prove the applicability for a wide range of 3D applications. Our work innovatively combines polarization and depth information, opening the way for fully understanding and applying polarization properties in the 3D domain.

RESUMEN

The wavelength tuning range of a tunable vertical-cavity surface-emitting laser (VCSEL) is strongly influenced by the design of the interface between the semiconductor cavity and the air cavity. A simplified model is used to investigate the origin of the dramatic differences in free spectral range (FSR) and tuning slope observed in semiconductor cavity dominant, extended cavity, and air cavity dominant VCSELs. The differences arise from the positioning of the resonant and antiresonant wavelengths of the semiconductor cavity with respect to the center wavelength. The air cavity dominant design is realized by designing an antiresonant semiconductor cavity, resulting in a larger tuning slope near the center of the tuning range and a wider FSR toward the edges of the tuning range. The findings from the simplified model are confirmed with the simulation of a full VCSEL structure. Using an air cavity dominant design, an electrically pumped laser with a tuning range of 68.38 nm centered at 1056.7 nm at a 550 kHz sweep rate is demonstrated with continuous wave emission at room temperature. This epitaxial design rule can be used to increase the tuning range of tunable VCSELs, making them more applicable in swept-source optical coherence tomography and frequency-modulated continuous-wave LIDAR systems.

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We report tunable VCSELs emitting around 1060 nm, enabled by high-contrast grating (HCG) mirror. Single-mode continuous-wave (CW) operation up to 110 °C is demonstrated, with room-temperature single-mode output power >1.3 mW at a very low threshold of ~300 µA. The obtained thermal resistance of 0.88 °C/mW is low for VCSELs with an oxide-confined laser aperture. A wide, continuous tuning range up to 40 nm was achieved with electrostatic and thermal tuning, at a fast tuning speed up to 1.15 MHz. In addition, we developed transverse-mode control designs of HCGs to greatly improve the single-mode yield of oxidized VCSELs. The cost-effective, wafer-scale fabrication makes these VCSELs promising as tunable light sources for swept-source optical coherent tomography (SS-OCT) and LiDAR applications.

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In this Letter, we report the site-controlled growth of InP nanolasers on a silicon substrate with patterned SiO2 nanomasks by low-temperature metal-organic chemical vapor deposition, compatible with silicon complementary metal-oxide-semiconductor (CMOS) post-processing. A two-step growth procedure is presented to achieve smooth wurtzite faceting of vertical nanopillars. By incorporating InGaAs multiquantum wells, the nanopillar emission can be tuned over a wide spectral range. Enhanced quality factors of the intrinsic InP nanopillar cavities promote lasing at 0.87 and 1.21 µm, located within two important optical telecommunication bands. This is the first demonstration of a site-controlled III-V nanolaser monolithically integrated on silicon with a silicon-transparent emission wavelength, paving the way for energy-efficient on-chip optical links at typical telecommunication wavelengths.

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We demonstrate the room-temperature operation of a two-dimensional (2D) high-contrast grating (HCG) vertical-cavity surface-emitting laser (VCSEL) at 1080 nm. To the best of our knowledge, this is the first tunable electrically pumped surface-emitting laser using a 2D HCG. Our theory successfully explains the mechanism of broadband ultrahigh reflection of 2D HCGs. Our monolithic integrated laser exhibits single-mode output power above 0.68 mW under continuous-wave operation. Wavelength tunability is demonstrated via microelectromechanical system-controlled voltage.

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We present a new platform based on suspended III-V semiconductor nanopillars for direct integration of optoelectronic devices on a silicon substrate. Nanopillars grown in core-shell mode with InGaAs/InP quantum wells can support long-wavelength Fabry-Pérot resonances at room temperature with this novel configuration. Experimental results are demonstrated at a silicon-transparent wavelength of 1460 nm, facilitating integration with silicon platform.

RESUMEN

The direct growth of III-V nanostructures on silicon has shown great promise in the integration of optoelectronics with silicon-based technologies. Our previous work showed that scaling up nanostructures to microsize while maintaining high quality heterogeneous integration opens a pathway toward a complete photonic integrated circuit and high-efficiency cost-effective solar cells. In this paper, we present a thorough material study of novel metastable InP micropillars monolithically grown on silicon, focusing on two enabling aspects of this technology-the stress relaxation mechanism at the heterogeneous interface and the microstructure surface quality. Aberration-corrected transmission electron microscopy studies show that InP grows directly on silicon without any amorphous layer in between. A set of periodic dislocations was found at the heterointerface, relaxing the 8% lattice mismatch between InP and Si. Single crystalline InP therefore can grow on top of the fully relaxed template, yielding high-quality micropillars with diameters expanding beyond 1 µm. An interesting power-dependence trend of carrier recombination lifetimes was captured for these InP micropillars at room temperature, for the first time for micro/nanostructures. By simply combining internal quantum efficiency with carrier lifetime, we revealed the recombination dynamics of nonradiative and radiative portions separately. A very low surface recombination velocity of 1.1 × 10(3) cm/sec was obtained. In addition, we experimentally estimated the radiative recombination B coefficient of 2.0 × 10(-10) cm(3)/sec for pure wurtzite-phased InP. These values are comparable with those obtained from InP bulk. Exceeding the limits of conventional nanowires, our InP micropillars combine the strengths of both nanostructures and bulk materials and will provide an avenue in heterogeneous integration of III-V semiconductor materials onto silicon platforms.

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RESUMEN

Optical properties of two-dimensional (2D) high-contrast gratings are investigated. We analyze the mechanisms for high-contrast gratings to function as various high-performance optical components. Our top-down design procedure allows us to efficiently obtain initial structural parameters and engineer them for a wide range of applications, such as reflectors, filters, resonators, waveplates, and even 2D phase plates. Simulation results of our designed structures show ultra-high power efficiency, and excellent agreement with our predicted functionalities.

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Cavity optomechanics explores the interaction between optical field and mechanical motion. So far, this interaction has relied on the detuning between a passive optical resonator and an external pump laser. Here, we report a new scheme with mutual coupling between a mechanical oscillator supporting the mirror of a laser and the optical field generated by the laser itself. The optically active cavity greatly enhances the light-matter energy transfer. In this work, we use an electrically-pumped vertical-cavity surface-emitting laser (VCSEL) with an ultra-light-weight (130 pg) high-contrast-grating (HCG) mirror, whose reflectivity spectrum is designed to facilitate strong optomechanical coupling, to demonstrate optomechanically-induced regenerative oscillation of the laser optomechanical cavity. We observe >550 nm self-oscillation amplitude of the micromechanical oscillator, two to three orders of magnitude larger than typical, and correspondingly a 23 nm laser wavelength sweep. In addition to its immediate applications as a high-speed wavelength-swept source, this scheme also offers a new approach for integrated on-chip sensors.

RESUMEN

We report an electrically pumped hybrid cavity AlGaInAs-silicon long-wavelength VCSEL using a high contrast grating (HCG) reflector on a silicon-on-insulator (SOI) substrate. The VCSEL operates at silicon transparent wavelengths ~1.57 µm with >1 mW CW power outcoupled from the semiconductor DBR, and single-mode operation up to 65 °C. The thermal resistance of our device is measured to be 1.46 K/mW. We demonstrate >2.5 GHz 3-dB direct modulation bandwidth, and show error-free transmission over 2.5 km single mode fiber under 5 Gb/s direct modulation. We show a theoretical design of SOI-HCG serving both as a VCSEL reflector as well as waveguide coupler for an in-plane SOI waveguide, facilitating integration of VCSEL with in-plane silicon photonic circuits. The novel HCG-VCSEL design, which employs scalable flip-chip eutectic bonding, may enable low cost light sources for integrated optical links.

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We use low-temperature microphotoluminescence and photoluminescence excitation spectroscopy to measure the valence band parameters of single wurtzite InGaAs nanoneedles. The effective indium composition is measured by means of polarization-dependent Raman spectroscopy. We find that the heavy-hole and light-hole splitting is ∼95 meV at 10 K and the Stokes shift is in the range of 35-55 meV. These findings provide important insight in the band structure of wurtzite InGaAs that could be used for future bandgap engineering.

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We report on microelectromechanical systems (MEMS)-actuated 32 × 32 optical phased arrays (OPAs) with high fill-factors and microsecond response time. To reduce the mirror weight and temperature-dependent curvature, we use high-contrast-grating (HCG) mirrors comprising a single layer of sub-wavelength polysilicon gratings with 400 nm thickness, 1250 nm pitch, and 570 nm grating bar width. The mirror has a broad reflection band and a peak reflectivity of 99.9% at 1550 nm wavelength. With 20 × 20 µm2 pixels and 2 µm, the OPA has a total aperture of 702 × 702 µm2 and a fill factor of 85%. The OPA is electrostatically controlled by voltage and has a total field of view of ± 2°, an instantaneous field of view (beam width) of 0.14°, and a response time of 3.8 µs. The latter agrees well with the mechanical resonance frequency of the HCG mirror (0.42 MHz).

RESUMEN

We report a high speed 8x8 optical phased array using tunable 1550 nm all-pass filters with ultrathin high contrast gratings (HCGs) as the microelectromechanical-actuated top reflectors. The all-pass filter design enables a highly efficient phase tuning (1.7 π) with a small actuation voltage (10 V) and actuation displacement of the HCG (50 nm). The microelectromechanical HCG structure facilitates a high phase tuning speed >0.5 MHz. Beam steering is experimentally demonstrated with the optical phased array.

RESUMEN

Alloy composition homogeneity plays an important role in the device performance of III-V heterostructures. In this work, we study the spatial composition uniformity of n-In0.12Ga0.88As/i-In0.2Ga0.8As/p-GaAs core-shell nanopillars monolithically grown on silicon. Cross sections extracted along the axial and radial directions are examined with transmission electron microscopy and energy-dispersive X-ray spectroscopy. Interestingly, indium-deficient segments with width ∼5 nm are observed to develop along the radial ⟨112̅0⟩ directions in the InGaAs layers. We attribute this spontaneous ordering to capillarity effect and difference in group-III adatom diffusion lengths. The slight fluctuation in indium content (∼4%), however, does not induce any noticeable misfit defects in the pure wurtzite-phased crystal. In contrast, the heterostructure exhibits excellent alloy composition uniformity along the axial [0001] direction. Furthermore, abrupt transitions of gallium and indium are seen at the heterointerfaces. These remarkable properties give rise to extraordinary optical performances. Lasing is achieved in the core-shell nanopillars upon optical pump despite the observed alloy composition fluctuation in the radial directions. The results here reveal the potential of the InGaAs-based core-shell heterostructures as efficient optoelectronic devices and high-speed heterojunction transistors directly integrated on silicon.

RESUMEN

III-V compound semiconductors can exist in two major crystal phases, namely, zincblende (ZB) and wurtzite (WZ). While ZB is thermodynamically favorable in conventional III-V epitaxy, the pure WZ phase can be stable in nanowires with diameters smaller than certain critical values. However, thin nanowires are more vulnerable to surface recombination, and this can ultimately limit their performances as practical devices. In this work, we study a metastable growth mechanism that can yield purely WZ-phased InGaAs microstructures on silicon. InGaAs nucleates as sharp nanoneedles and expand along both axial and radial directions simultaneously in a core-shell fashion. While the base can scale from tens of nanometers to over a micron, the tip can remain sharp over the entire growth. The sharpness maintains a high local surface-to-volume ratio, favoring hexagonal lattice to grow axially. These unique features lead to the formation of microsized pure WZ InGaAs structures on silicon. To verify that the WZ microstructures are truly metastable, we demonstrate, for the first time, the in situ transformation from WZ to the energy-favorable ZB phase inside a transmission electron microscope. This unconventional core-shell growth mechanism can potentially be applied to other III-V materials systems, enabling the effective utilization of the extraordinary properties of the metastable wurtzite crystals.

RESUMEN

Single-crystalline wurtzite InGaAs/InGaP nanopillars directly grown on a lattice-mismatched silicon substrate are demonstrated. The nanopillar growth is in a core-shell manner and gives a sharp, defect-free heterostructure interface. The InGaP shell provides excellent surface passivation effect for InGaAs nanopillars, as attested by 50-times stronger photoluminescence intensities and 5-times greater enhancements in the carrier recombination lifetimes, compared to the unpassivated ones. A record value of 16.8% internal quantum efficiency for InGaAs-based nanopillars was attained with a 50-nm-thick InGaP passivation layer. A room-temperature optically pumped laser was achieved from single, as-grown InGaAs nanopillars on silicon with a record-low threshold. Superior material qualities of these InGaP-passivated InGaAs nanopillars indicate the possibility of realizing high-performance optoelectronic devices for photovoltaics, optical communication, semiconductor nanophotonics, and heterogeneous integration of III-V materials on silicon.

RESUMEN

A comprehensive theoretical model for the long-wavelength micro-electro-mechanical-tunable high-contrast-grating vertical-cavity surface-emitting lasers is presented. Our band structure model calculates the optical gain and spontaneous emission of the InGaAlAs quantum well active region. The grating reflectivity and the cavity resonance condition are investigated through optical modeling. Correlating the results with the electrostatic model for the micro-electro-mechanical system, we accurately predict the measurements on the voltage-contolled lasing wavelength. Furthermore, our calculated temperature-dependent wavelength-tunable light output vs. current (L-I) curves show excellent agreement with experiment.

RESUMEN

Nanoscale self-assembly offers a pathway to realize heterogeneous integration of III-V materials on silicon. However, for III-V nanowires directly grown on silicon, dislocation-free single-crystal quality could only be attained below certain critical dimensions. We recently reported a new approach that overcomes this size constraint, demonstrating the growth of single-crystal InGaAs/GaAs and InP nanoneedles with the base diameters exceeding 1 µm. Here, we report distinct optical characteristics of InP nanoneedles which are varied from mostly zincblende, zincblende/wurtzite-mixed, to pure wurtzite crystalline phase. We achieved, for the first time, pure single-crystal wurtzite-phase InP nanoneedles grown on silicon with bandgaps of 80 meV larger than that of zincblende-phase InP. Being able to attain excellent material quality while scaling up in size promises outstanding device performance of these nanoneedles. At room temperature, a high internal quantum efficiency of 25% and optically pumped lasing are demonstrated for single nanoneedle as-grown on silicon substrate. Recombination dynamics proves the excellent surface quality of the InP nanoneedles, which paves the way toward achieving multijunction photovoltaic cells, long-wavelength heterostructure lasers, and advanced photonic integrated circuits.

RESUMEN

Monolithic integration of III-V optoelectronic devices with materials for various functionalities inexpensively is always desirable. Polysilicon (poly-Si) is an ideal platform because it is dopable and semiconducting, and can be deposited and patterned easily on a wide range of low cost substrates. However, the lack of crystalline coherency in poly-Si poses an immense challenge for high-quality epitaxial growth. In this work, we demonstrate, for the first time, direct growth of micrometer-sized InGaAs/GaAs nanopillars on polysilicon. Transmission electron microscopy shows that the micrometer-sized pillars are single-crystalline with pure wurzite-phase, far exceeding the substrate crystal grain size ~100 nm. The high quality growth is enabled by the unique tapering geometry at the base of the nanostructure, which reduces the effective InGaAs/Si contact area to <40 nm in diameter. The small footprint not only reduces stress due to lattice mismatch but also prevents the nanopillar from nucleating on multiple Si crystal grains. This relaxes the grain size requirement for poly-Si, potentially reducing the cost for poly-Si deposition. Lasing is achieved in the as-grown pillars under optical pumping, attesting their excellent crystalline and optical quality. These promising results open up a pathway for low-cost synergy of optoelectronics with other technologies such as CMOS integrated circuits, sensing, nanofluidics, thin film transistor display, photovoltaics, and so forth.

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