RESUMEN
Coherent extreme-ultraviolet pulses from high-harmonic generation have ample applications in attosecond science, lensless imaging, and industrial metrology. However, tailoring complex spatial amplitude, phase, and polarization properties of extreme-ultraviolet pulses is made nontrivial by the lack of efficient optical elements. Here, we have overcome this limitation through nanoengineered solid samples, which enable direct control over amplitude and phase patterns of nonlinearly generated extreme-ultraviolet pulses. We demonstrate experimental configurations and emitting structures that yield spatially patterned beam profiles, increased conversion efficiencies, and tailored polarization states. Furthermore, we use the emitted patterns to reconstruct height profiles, probe the near-field confinement in nanostructures below the diffraction limit of the fundamental radiation, and to image complex structures through coherent diffractive emission from these structures. Our results pave the way for introducing sub-fundamental-wavelength resolution imaging, direct manipulation of beams through nanoengineered samples, and metrology of nanostructures into the extreme-ultraviolet spectral range.
RESUMEN
Improving the brightness of high-harmonic generation (HHG) sources is one of the major goals for next-generation ultrafast, imaging and metrology applications in the extreme-ultraviolet spectrum. Previous research efforts have demonstrated a plethora of techniques to increase the conversion efficiency of HHG. However, few studies so far have addressed how to simultaneously minimize the divergence and improve focusability, which all contribute to an increased brightness of the source. Here, we investigate how to improve both photon yield and divergence, which is directly linked to focusability, when adding the second harmonic to the fundamental driving field. We study the effects of the relative polarization in two-color HHG and compare the results to a one-color configuration. In a perpendicular two-color field, the relative phase between the two colors can be used to suppress or enhance recombination of either the long or the short trajectories. This allows to exert control over the divergence of the harmonics. In a parallel two-color field, the ionization rate is modified through the two-color phase, which selects trajectories during the ionization step. This enhances the total yield. We elaborate on the underlying mechanisms for parallel, perpendicular, and intermediate polarization angles, and confirm our experimental observations with simulations.
RESUMEN
We perform wavefront measurements of high-order harmonics using an extreme-ultraviolet (XUV) Hartmann sensor and study how their spatial properties vary with different generation parameters, such as pressure in the nonlinear medium, fundamental pulse energy and duration as well as beam size. In some conditions, excellent wavefront quality (up to λ/11) was obtained. The high throughput of the intense XUV beamline at the Lund Laser Centre allows us to perform single-shot measurements of both the full harmonic beam generated in argon and individual harmonics selected by multilayer mirrors. We theoretically analyze the relationship between the spatial properties of the fundamental and those of the generated high-order harmonics, thus gaining insight into the fundamental mechanisms involved in high-order harmonic generation (HHG).