1.
ACS Appl Mater Interfaces
; 7(42): 23398-401, 2015 Oct 28.
Artículo
en Inglés
| MEDLINE
| ID: mdl-26406303
RESUMEN
We report indomethacin as a photoresist that can be dry-deposited (as well as spin-coated), and developed in weak aqueous base. This is the first reported patterning of indomethacin as a resist material. Nanometer-scale patterns were achieved through DUV photolithography and the underlying patterning mechanism was investigated.